|[[電子照射-電子励起による相転移]]| ---- *金属/シリコン酸化物界面におけるシリサイド形成 [#vee1e168] REFERENCES REFERENCES~ [1] J. -G. Lee, %%%T. Nagase%%%, H. Yasuda, H. Mori, Journal of Applied Physics, 117, 194307 1-8 (2015)., "Synthesis of metal silicide at metal/silicon oxide interface by electronic excitation", http://dx.doi.org/10.1063/1.4921429