金属/SiOx 界面における結晶化 の履歴ソース(No.2)


|[[電子照射-電子励起による相転移]]|
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*金属/シリコン酸化物界面における結晶化 [#o148d5f9]


REFERENCES~
+%%%T. Nagase%%%, R. Yamashita, J.-G. Lee, Journal of Applied Physics, 119, 165103 1-9 (2016)., "Electron irradiation induced crystallization at metallic amorphous / silicon oxide interfaces caused by electronic excitation", http://dx.doi.org/10.1063/1.4947519
+%%%T. Nagase%%%, R. Yamashita, J.-G. Lee, AMTC Letters, 5, 198-199 (2016), "In situ observation of the irradiation induced structural change at palladium/silicon oxide (Pd/SiOx) interfaces under electron irradiation focusing on the temperature dependence", http://amtc5.com/


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