|[[Material modification by electron irradiation - electronic excitation]]|
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*Formation of metallic amorphous at metal/SiOx interface [#o43ac042]
REFERENCES~
+%%%T. Nagase%%%, R. Yamashita, A. Yabuuchi, J.-G. Lee, AIP Advances, 5, 117145 1-7 (2015), "An amorphous phase formation at palladium / silicon oxide (Pd/SiOx?) interface through electron irradiation - electronic excitation process", http://dx.doi.org/10.1063/1.4936629